dc.contributor.author | Mugwang’a, FK | |
dc.contributor.author | Karimi, PK | |
dc.contributor.author | Njoroge, WK | |
dc.contributor.author | Omayio, O | |
dc.contributor.author | Waita, SM | |
dc.date.accessioned | 2013-06-15T13:42:21Z | |
dc.date.issued | 2012 | |
dc.identifier.citation | INTERNATIONAL JOURNAL OF ADVANCED RENEWABLE ENERGY RESEARCH Vol. 1, Issue. 8, pp. 474-480, 2012 | en |
dc.identifier.uri | http://usspress.com/j/index.php/jarer/article/view/58/61 | |
dc.identifier.uri | http://erepository.uonbi.ac.ke:8080/xmlui/handle/123456789/34543 | |
dc.description.abstract | Cu2O thin films have been deposited using
reactive dc magnetron sputtering technique using an Edward
Auto 306 Magnetron Sputtering System. Transmittance and
reflectance data in the range 300 nm-2500 nm were obtained
using UV-VIS NIR Spectrophotometer Solid State 3700 DUV
for all the thin films samples that were prepared.
Transmittance values of above 70% were observed. The
optical measurements were simulated using SCOUT 98
software to determine optical constants and optical bad gap
of the thin. The optical properties in these films were varied
by varying oxygen flow rate at constant powerof 200 W.
Optical studies show a direct allowed transition and a shift in
the optical absorption edge as the oxygen flow rate varies at
constant argon flow rate and other deposition parameters.
These results show that single phase Cu2O thin films can be
synthesized at a relatively low substrate temperature using
the reactive dc magnetron sputtering technique. Band gap
values of 1.62 eV –2.54 eV is observed. The surface sheet
resistivities at room temperature of 298 K were found to
vary with the deposition parameters and film thickness.
Urbach energy varied between 0.6 ×10-4 to 1.92 ×104. | en |
dc.language.iso | en | en |
dc.subject | Cuprous Oxide | en |
dc.subject | Thin films | en |
dc.subject | Optical properties | en |
dc.subject | Dc magnetron sputtering technique | en |
dc.subject | Solar cell applications | en |
dc.title | Optical Characterization of Copper Oxide Thin Films Prepared By Reactive Dc Magnetron Sputtering For Solar Cell Applications | en |
dc.type | Article | en |
local.publisher | Department of Physics, University of Nairobi, | en |
local.publisher | Pwani university college, physics department | en |
local.publisher | Kenyatta University, physics department | en |