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    ZnO:Sn deposition by reactive evaporation: Effects of Sn doping on the electrical and optical properties

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    Date
    02-07-13
    Author
    Munguti LK.
    Njoroge Walter.
    Musembi Robinson J.
    Type
    Working Paper
    Language
    en
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    Abstract
    Tin doped zinc oxide thin films were deposited by reactive evaporation under various tin doping levels ranging from 1% to 8%. The deposition was done using Edwards Auto 306 coating unit at room temperature (25°C) and 5.0 x 10-5 mbar of chamber pressure. The optical transmittance spectra was obtained using UV-Vis-NIR spectrophotometer 3700 DUV in the visible wavelength 380-750nm. The doped films showed high transmittance >75% although slightly lower than that of undoped films. The band gap ranged from 2.95-3.95eV with the lowest value been attained at 4% tin doping. For the electrical characterization, sheet resistivity was carried using the four point probe at room temperature (25°C). The sheet resistivity ranged from 24.3-26.7Ωcm although it decreased with increase in doping concentration.
    URI
    http://erepository.uonbi.ac.ke/bitstream/handle/11295/44013/FULL%20TEXT.pdf?sequence=1&isAllowed=y
    Citation
    Munguti, L. K., Njoroge, W., & Musembi, R. J. (2013). ZnO: Sn deposition by reactive evaporation: Effects of Sn doping on the electrical and optical properties.
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    • School Of Biological Sciences [54]

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